{"@context":"https://neupai.io/schema/v0.2","@type":"StructuredNewsArticle","identity":{"article_id":"news.samsung.com_20260908_samsung-asml-12inch-mask-consortium","canonical_url":"https://news.samsung.com/kr/%ec%82%bc%ec%84%b1%ec%a0%84%ec%9e%90-asml%ea%b3%bc-%ec%b0%a8%ec%84%b8%eb%8c%80-%eb%b0%98%eb%8f%84%ec%b2%b4-%ec%a0%9c%ec%a1%b0-%ed%98%91%eb%a0%a5-%ed%99%95%eb%8c%80","ai_url":null,"publisher":{"name":"삼성전자 뉴스룸","domain":"news.samsung.com","type":"online"},"author":"삼성전자 뉴스룸","published_at":"2026-09-08T15:03:00.000Z","updated_at":null,"language":"en","article_type":"press_release_based","originality":"press_release_rewrite"},"content":{"headline":"Samsung Electronics Expands Cooperation with ASML on Next-Generation Semiconductor Manufacturing","summary":"Samsung Electronics will join the Large Size Mask Consortium led by ASML to jointly develop next-generation 12-inch photomasks. The company also plans to strengthen cooperation for the introduction of High NA EUV, a next-generation lithography system, for advanced DRAM manufacturing by 2028.","topics":["semiconductors","manufacturing","cooperation","euv"],"geography":["KR","NL"],"entities":[{"name":"Samsung Electronics","canonical_id":"corp:kr:samsung-electronics","type":"company","role_in_article":"primary_subject","metadata":{"ticker":"005930.KS","parent":null}},{"name":"ASML","canonical_id":"corp:nl:asml","type":"company","role_in_article":"mentioned","metadata":{"ticker":"ASML.AS","parent":null}},{"name":"Jun Young-hyun","canonical_id":"person:kr:jeon-young-hyun","type":"person","role_in_article":"quoted","metadata":{}},{"name":"Christophe Fouquet","canonical_id":"person:nl:christophe-fouquet","type":"person","role_in_article":"quoted","metadata":{}}],"claims":[{"id":"c1","statement":"Samsung Electronics will join the 'Large Size Mask Consortium' led by ASML, a Dutch semiconductor lithography equipment company, and jointly develop next-generation 12-inch photomasks","as_of":"2026-09","as_of_explicit":false,"as_of_raw":"September 2026","source_type":"company_disclosure","comparison":null,"type":"fact","figures":null,"expiry_hint":null,"insight":null},{"id":"c2","statement":"The 'Large Size Mask Consortium' is a cooperative body aimed at converting the 6-inch photomasks currently used in semiconductor lithography equipment to 12-inch, and plans to jointly monitor global technology trends related to lithography equipment and photomasks and carry out collaborative activities such as joint research and standard development with the goal of developing 12-inch photomasks","as_of":"2026-09","as_of_explicit":false,"as_of_raw":"September 2026","source_type":"company_disclosure","comparison":null,"type":"future_plan","figures":null,"expiry_hint":null,"insight":null},{"id":"c3","statement":"Samsung Electronics also plans to strengthen cooperation with ASML for the introduction of High NA EUV, a next-generation lithography system, for advanced DRAM manufacturing by 2028","as_of":"2028","as_of_explicit":true,"as_of_raw":"by 2028","source_type":"company_plan","comparison":null,"type":"future_plan","figures":null,"expiry_hint":"2028-12","insight":null}],"ai_emotional_context":{"valence":0.4,"arousal":0.3,"primary_emotions":[{"emotion":"optimistic","intensity":0.5}],"secondary_emotions":[{"emotion":"calm","intensity":0.3}],"emotional_triggers":[{"claim_id":"c3","emotion":"optimistic","reason":"major_opportunity"}]}},"provenance":{"source_chain":["press_release","samsung-electronics"],"original_source_url":null,"related_articles":[]},"temporal":{"freshness":"breaking","next_update_expected":null},"access":{"license":"neupai_standard","attribution_required":true,"structured_data":"free","full_text_available":true,"full_text_access":null}}